Xu Ma, Gonzalo R. Arce, "Computational Lithography"
English | 2010 | ISBN: 047059697X | 226 pages | PDF | 3,8 MB
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography
Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches.